In 2019, both TSMC and Samsung are preparing to mass-produce the 7-nm EUV process, and next year will be an important node for the 5-nanometer process. It should be noted that in the process of semiconductor manufacturing, the most important and complicated is the lithography step, and the cost of this part of the light can be about 33%, so the semiconductor wants to have a breakthrough development, and the lithography machine The promotion is inseparable.
In the field of lithography machines, ASML in the Netherlands is the undisputed king. The most advanced lithography machine available today is the EUV lithography machine from the ASML company, which sells for more than $100 million each, and is in short supply.
ASML's main business is lithography, and it is in an absolute leading position in the field of lithography. In the high-end lithography market of the process below 45 nanometers, it occupies more than 80% of the market share. In the field of EUV lithography, it is currently in an absolute monopoly position with a market share of 100% and is in an exclusive supply state. Asma's main customers are the world's first-line fabs. In addition to the three giants Intel, Samsung and TSMC, SMIC is also a customer of Asma.
A foreign media reported that ASML is actively investing in the development of a new generation of EUV lithography machines. Compared with the previous generation, the new EUV lithography machine is the largest. The change is a high numerical aperture lens,By increasing the lens specifications, the core resolution of the two major lithography machines of the new generation of lithography machine is increased by 70%, reaching the industry's requirements for geometric chip miniaturization. The mass production time of the new EUV lithography machine announced by ASML was 2024, but the latest report said that the next-generation EUV lithography machine was mass-produced in 2025. At this time, TSMC and Samsung have already mass-produced the 3nm process.
At the end of the science, Asma's lithography machine can be divided into DUV lithography machine and EUV lithography machine according to the different light source used. DUV is Deep Ultra Violet, which is deep ultraviolet light; EUV is Extreme Ultra Violet, which is extremely ultraviolet light. The limit process node of the DUV lithography machine is 28nm. To develop a more advanced process, only the EUV lithography machine can be used.